This article summarizes a presentation done to update the status of a research project happening quietly in Russia. They are exploring a way to compete with ASML's "EUV" method of producing high-end chips. The basic idea is by using a different wave length of light you can avoid a bunch of the complexities in the ASML machine and produce similar results for far less money. Russia has long been a world leader in photo lithography research and a huge amount of the work done to create ASML/EUV was done by Russians living in Europe and the USA, so it is very credible for them to be able to produce something out of this work. The big game changer is China who have the manufacturing ability to commercialize it as well as a market and demand, plus money to fund development.
