Russia aims for 11.2 nm EUV using Xenon lasers, instead of ASML's approach of zapping tin droplets
(www-cnews-ru.translate.goog)https://www-cnews-ru.translate.goog/news/top/2024-12-13_v_rossii_razrabotali_dorozhnuyu?_x_tr_sl=ru&_x_tr_tl=en&_x_tr_hl=en&_x_tr_pto=wappAfter watching a YouTube video with only one fact (11.2 nanometers) I searched the web and worked my way back along the chain of Chinese Whispers to reach a Russian source. Using Google translate, this does seem to be genuinely interesting, albeit on a ten year time scale.
In the short term Russia might be managing home grown photo lithography at 350 nm next year, and the article says "The new laser will "pump up" it to 130 nm." Does that mean frequency doubling to get 130 nm light from 260 nm light? Or frequency tripling to get 130 nm light from 390 nm light? I'm still reading journalism, even if it is Russian :-(
